Development of alternative Cr(VI)-free etching solution

Etching is one of the key steps to achieve excellent adhesion between the plastic surface and the metallic layer. The current SoA methods rely on acidic solutions containing large amounts of the highly toxic and carcinogenic CrO₃. Creative Nano has successfully developed a new process for the etching of ABS, PC/ABS and PA12 plastic substrates using H₂SO₄/H₂O₂ mixtures (piranha solution) which led to the deposition of a uniform Ni-P layer. The main drawback of the piranha solution is its degradation which is attributed to the decomposition of H₂O₂ to H₂O and O₂. For that reason, Creative Nano has developed a new etching solution containing potassium permanganate (KMnO₄) and a mixture of H₂SO₄/H₃PO₄. After an optimization, this etching solution can lead to successful metallization of ABS, PC/ABS and PA12 in shorter immersion times and temperatures compared to the SoA methods.